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PROCEEDINGS & JOURNAL ARTICLES

Proceedings Volume 8788 (Optical Measurement Systems for Industrial Inspection VIII) >
May 13, 2013
A polarization-based frequency shifting interferometry for inspecting transparent objects in microelectronics manufacturing
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Proc SPIE. 8788, Optical Measurement Systems for Industrial Inspection VIII, 87880P (May 13, 2013);  doi:10.1117/12.2020736
Proceedings Volume 8788 (Optical Measurement Systems for Industrial Inspection VIII) >
May 13, 2013
Nanometrology of periodic nanopillar arrays by means of light scattering
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Proc SPIE. 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881O (May 13, 2013);  doi:10.1117/12.2020880
Proceedings Volume 8788 (Optical Measurement Systems for Industrial Inspection VIII) >
May 13, 2013
Phase information in coherent Fourier scatterometry
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Proc SPIE. 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881P (May 13, 2013);  doi:10.1117/12.2020506
Proceedings Volume 8788 (Optical Measurement Systems for Industrial Inspection VIII) >
May 13, 2013
Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors
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Proc SPIE. 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881R (May 13, 2013);  doi:10.1117/12.2020248
Proceedings Volume 8788 (Optical Measurement Systems for Industrial Inspection VIII) >
May 13, 2013
Optical vibration analysis of MEMS devices with pm-resolution in x, y, and z directions
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Proc SPIE. 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881U (May 13, 2013);  doi:10.1117/12.2019342
Proceedings Volume 8789 (Modeling Aspects in Optical Metrology IV) >
May 13, 2013
Assessment of the scatterometry capability to detect an etch process deviation
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Proc SPIE. 8789, Modeling Aspects in Optical Metrology IV, 878902 (May 13, 2013);  doi:10.1117/12.2020486
Proceedings Volume 8789 (Modeling Aspects in Optical Metrology IV) >
May 13, 2013
Mueller matrix characterization using spectral reflectometry
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Proc SPIE. 8789, Modeling Aspects in Optical Metrology IV, 878903 (May 13, 2013);  doi:10.1117/12.2022549
Proceedings Volume 8789 (Modeling Aspects in Optical Metrology IV) >
May 13, 2013
Numerical investigations of the influence of different commonly applied approximations in scatterometry
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Proc SPIE. 8789, Modeling Aspects in Optical Metrology IV, 878904 (May 13, 2013);  doi:10.1117/12.2022108
Proceedings Volume 8789 (Modeling Aspects in Optical Metrology IV) >
May 13, 2013
Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle
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Proc SPIE. 8789, Modeling Aspects in Optical Metrology IV, 878905 (May 13, 2013);  doi:10.1117/12.2020487
Proceedings Volume 8789 (Modeling Aspects in Optical Metrology IV) >
May 13, 2013
Design rules for a compact and low-cost optical position sensing of MOEMS tilt mirrors based on a Gaussian-shaped light source
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Proc SPIE. 8789, Modeling Aspects in Optical Metrology IV, 87890A (May 13, 2013);  doi:10.1117/12.2019251

BOOKS

Field Guide to Adaptive Optics
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Field Guide to Optical Lithography
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