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Over the last two decades, the ability to achieve well-defined size, geometry, and distribution of plasmonic structures has extensively been studied. Here, we introduce a unique strained induced self-rolling fabrication technique suitable to fabricate three-dimensional multilayer thin film-based plasmonic devices. The photoresist-based technique enables the fabrication of nanohole arrays on SiO2/Au-based rolled-up tubes (RUTs). The curved nature of the tube allows the fabrication of an out-of-plane metasurface that can effectively control the light compared to the common planar counterparts.
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