Form Birefringence In Thin Films

F. Horowitz; H. A. Macleod

doi:10.1117/12.934745

7 November 1983 Form Birefringence In Thin Films

F. Horowitz, H. A. Macleod

Proceedings Volume 0380, Los Alamos Conf on Optics '83; (1983) https://doi.org/10.1117/12.934745
Event: Los Alamos Conference on Optics, 1983, New Mexico, United States

Abstract

We consider in this work the anisotropic microstructure contribution to the polarization effect in thin films deposited at high angles of vapor incidence. Previous reports that metal films mainly respond as polarizers under such conditions have been confirmed. Structural anisotropy in dielectric films, rather than affecting the extinction coefficient values differently along different directions, seems to induce significant asymmetry in the refractive index values that enables us to find a retarder-like behavior. Quantitative analysis of the effect under normal incidence light at 632.8 nm is presented for aluminum and zirconium oxide films, and its structural origin is discussed.

Citation Download Citation

F. Horowitz and H. A. Macleod "Form Birefringence In Thin Films", Proc. SPIE 0380, Los Alamos Conf on Optics '83, (7 November 1983); https://doi.org/10.1117/12.934745

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