Paper
1 January 1986 A Small Gas Puff Z-Pinch X-Ray Source
P. Choi, A. E. Dangor, C. Deeney
Author Affiliations +
Proceedings Volume 0733, Soft X-Ray Optics and Technology; (1986) https://doi.org/10.1117/12.964891
Event: Soft X-Ray Optics and Technology, 1987, Berlin, Germany
Abstract
The gas puff Z-pinch is an intense pulsed plasma X-ray source energized by a capacitor bank. Typically 5-10% of the electrical energy stored in the bank is converted into X-ray radiations with wavelengths less than 100 Å. Such devices have applications in X-ray microscopy, lithography, spectroscopy and X-ray optics engineering. Here we present the results of a parmetric study of the X-ray emission from a small gas puff Z-pinch which has 4kJ of stored electrical energy. The quantities measured are the soft X-ray emission in the wavelength range 4 to 85 A and the hard X-ray emission with wavelength less than 2.5 A. These quantities are found to depend on the gas used and the mass of gas imploded. Conditions exist that maximise the soft X-ray emission from the pinch. It is also shown that the hard X-ray emission can be reduced significantly by changing the anode material and by varying the mass of the gas imploded.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Choi, A. E. Dangor, and C. Deeney "A Small Gas Puff Z-Pinch X-Ray Source", Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); https://doi.org/10.1117/12.964891
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Cited by 7 scholarly publications.
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