Measurements Of Diffraction Properties Of Selected Multilayers Using A Triple-Axis Perfect Crystal X-Ray Diffractometer

Allan Hornstrup; Finn E. Christensen; Herbert W. Schnopper

doi:10.1117/12.964929

1 January 1986 Measurements Of Diffraction Properties Of Selected Multilayers Using A Triple-Axis Perfect Crystal X-Ray Diffractometer

Allan Hornstrup, Finn E. Christensen, Herbert W. Schnopper

Author Affiliations +

Proceedings Volume 0733, Soft X-Ray Optics and Technology; (1986) https://doi.org/10.1117/12.964929
Event: Soft X-Ray Optics and Technology, 1987, Berlin, Germany

Abstract

We present measurements of diffraction peaks from six different multilayers of W/Si, Ni/C and ReW/C-layering. We have used FeKa-radiation and a three-axis, perfect crystal, x-ray diffractometer. The measurements suggest that these multilayers do not suffer seriously from imperfections. Improper estimates of the relative layer thickness of the two components may be as important as imperfections for these multilayers. All the multilayers studied show mosaicity which would be expected to originate in the substrate.

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Allan Hornstrup, Finn E. Christensen, and Herbert W. Schnopper "Measurements Of Diffraction Properties Of Selected Multilayers Using A Triple-Axis Perfect Crystal X-Ray Diffractometer", Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); https://doi.org/10.1117/12.964929

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