Capabilities Of The Inspex EX2000 Patterned Wafer Inspection System

Francis S. Maldari

doi:10.1117/12.940380

1 September 1987 Capabilities Of The Inspex EX2000 Patterned Wafer Inspection System

Francis S. Maldari

Proceedings Volume 0774, Lasers in Microlithography; (1987) https://doi.org/10.1117/12.940380
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

This paper describes the effects of grazing angle illumination on the particle sensitivity for small particles resting on bare silicon wafers and on patterned wafers. A mathematical model of particle illumination is used to support data gathered from the Inspex EX2000 Patterned Wafer Inspection System. A methodology is given for setting up the instrument in order to achieve maximum particle sensitivity on patterned wafers.

Citation Download Citation

Francis S. Maldari "Capabilities Of The Inspex EX2000 Patterned Wafer Inspection System", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); https://doi.org/10.1117/12.940380

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