An Efficient Sample/Monte Carlo Methodology For Developing Robust Photolithography Processes

Douglas S. Thompson; Francisco A. Leon; Steven G. Duvall

doi:10.1117/12.940435

17 April 1987 An Efficient Sample/Monte Carlo Methodology For Developing Robust Photolithography Processes

Douglas S. Thompson, Francisco A. Leon, Steven G. Duvall

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940435
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

The development of robust photolithography processes requires methodologies for efficiently finding operating conditions that will minimize the sensitivity of critical dimension control to the effects of inevitable manufacturing variability. Photolithography modeling coupled with a Monte Carlo sampling scheme and contemporary statistical design techniques accelerate the identification of the best operating conditions by reducing the number of needed process development experiments.

Citation Download Citation

Douglas S. Thompson, Francisco A. Leon, and Steven G. Duvall "An Efficient Sample/Monte Carlo Methodology For Developing Robust Photolithography Processes", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940435

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