Analysis Of Linewidth Measurement Techniques Using The Low Voltage SEM

M. G. Rosenfield

doi:10.1117/12.940413

17 April 1987 Analysis Of Linewidth Measurement Techniques Using The Low Voltage SEM

M. G. Rosenfield

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940413
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

Linewidth measurement using the scanning electron microscope is not well understood. The basic intent is to measure the size of a structure from the secondary and backscattered electron signal generated by that structure^1-6. Thus, an accurate measurement requires an understanding of how the profile and critical dimension of the line being measured relate to the electron signal. The complicating factor is that different features generate different signals and that surroundings often influence the detected signal from a given feature.

Citation Download Citation

M. G. Rosenfield "Analysis Of Linewidth Measurement Techniques Using The Low Voltage SEM", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940413

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available