Noise Contributions To Feature Dimension Measurement In A Scanning Electron Microscope (Sem)

Jon R. Pearce; Duane C. Holmes

doi:10.1117/12.940422

17 April 1987 Noise Contributions To Feature Dimension Measurement In A Scanning Electron Microscope (Sem)

Jon R. Pearce, Duane C. Holmes

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940422
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

In the semiconductor field critical dimension (CD) measurement accuracies and repeat-abilities of 1% @ 3siqma are often required and supplied by instrument vendors. In a SEM the accuracy and repeatability of such measurements is related to the signal-to-noise (s/n) ratio of the signal carrying the topographical information of the feature. Noise sources associated with the irradiating beam, signal generation at the sample, signal collection and various signal processing techniques may have an effect on cd measurement statistics. Positional uncertainties of either the irradiating beam or the sample itself, will likewise contribute to c-d measurement uncertainties. This paper discusses the effects and require-ments of some of these noise sources - especially in the signal-intensity chain.

Citation Download Citation

Jon R. Pearce and Duane C. Holmes "Noise Contributions To Feature Dimension Measurement In A Scanning Electron Microscope (Sem)", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940422

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