Fourier Transform Infrared Photoluminescence

Nelson L. Rowell

doi:10.1117/12.941950

19 January 1988 Fourier Transform Infrared Photoluminescence

Nelson L. Rowell

Proceedings Volume 0822, Raman and Luminescence Spectroscopy in Technology; (1988) https://doi.org/10.1117/12.941950
Event: 31st Annual Technical Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, San Diego, CA, United States

Abstract

A commercial Fourier transform spectrometer has been modified to measure recombinant radiation (photoluminescence) under argon laser excitation from semiconducting and insu-lating solid samples at low temperatures. The experimental method is described detailing the criteria for optimizing the instrumentation and the limitations of the technique. The photoluminescence of following materials was studied as a function of laser intensity and wavelength and at various temperatures: (a) the large gap, indirect semiconductors Si, Ge, and SizGei_x, (b) the amorphous semiconductor a-Si:H, (c) the large gap, di-rect semiconductors, GaAs, InP, CdTe and Ga,Ini_,As, (d) the narrow gap, direct semiconductor, InSb, and (e) the insulator, KZni_1Co1F3, an infrared laser material.

Citation Download Citation

Nelson L. Rowell "Fourier Transform Infrared Photoluminescence", Proc. SPIE 0822, Raman and Luminescence Spectroscopy in Technology, (19 January 1988); https://doi.org/10.1117/12.941950

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