Paper
11 May 1988 Electrophotographic Process Control Simulation
Dana G Marsh, Paul H Stiebitz
Author Affiliations +
Proceedings Volume 0900, Imaging Applications in the Work World; (1988) https://doi.org/10.1117/12.944695
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States
Abstract
A first order model of an electrophotographic process under the influence of several process control loops has been developed. The model is used to examine the transient behavior of the system over a range of control conditions. Results illustrate the potential benefits of process control to image quality stability. However, it is also shown that poorly designed controls can lead to significant degradation in performance.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dana G Marsh and Paul H Stiebitz "Electrophotographic Process Control Simulation", Proc. SPIE 0900, Imaging Applications in the Work World, (11 May 1988); https://doi.org/10.1117/12.944695
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KEYWORDS
Control systems

Photoresistors

Process control

Image processing

Systems modeling

Absorbance

Mathematical modeling

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