Paper
30 June 2016 Numerical simulation of pitch button blocking optimization
Lunzhe Wu, Wenlan Gao, Aihuan Dun, Minghong Yang, Chaoyang Wei, Xueke Xu, Jianda Shao
Author Affiliations +
Proceedings Volume 10009, Third European Seminar on Precision Optics Manufacturing; 1000911 (2016) https://doi.org/10.1117/12.2236356
Event: Third European Seminar on Precision Optics Manufacturing, 2016, Teisnach, Germany
Abstract
An ideal pitch button blocking process determines the level of workpiece deformation, especially the high-aspect-ratio optics, during the blocking process and process of polishing later. We have studied the pitch button blocking process by Finite Element Analysis (FEA) according to the thermoelastic equation. Meanwhile, the optimized pitch button blocking has been gotten by FEA which includes the thickness and material of blocking plate, as well as the radius, arrangement, elastic modulus and coefficient of thermal expansion of pitch buttons. The numerical simulation of Nd:glass (Ø100 mm×2 mm thickness) shows that the surface figure change (ΔPV) which is induced by the thermal stress during pitch button blocking process is influenced seriously by the thickness of blocking plate.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lunzhe Wu, Wenlan Gao, Aihuan Dun, Minghong Yang, Chaoyang Wei, Xueke Xu, and Jianda Shao "Numerical simulation of pitch button blocking optimization", Proc. SPIE 10009, Third European Seminar on Precision Optics Manufacturing, 1000911 (30 June 2016); https://doi.org/10.1117/12.2236356
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KEYWORDS
Polishing

Numerical simulations

Photovoltaics

Finite element methods

Surface finishing

Stress analysis

Materials science

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