Power and pulse energy scaling for high-volume UV-laser microprocessing

Ralph Delmdahl; Oliver Haupt; Igor Bragin; Hans-Stephan Albrecht

doi:10.1117/12.2256018

17 February 2017 Power and pulse energy scaling for high-volume UV-laser microprocessing

Ralph Delmdahl, Oliver Haupt, Igor Bragin, Hans-Stephan Albrecht

Proceedings Volume 10092, Laser-based Micro- and Nanoprocessing XI; 1009215 (2017) https://doi.org/10.1117/12.2256018
Event: SPIE LASE, 2017, San Francisco, California, United States

Abstract

In industrial laser micro processing, throughput is as important as process quality. Treating large areas in minimum time is pivotal in achieving reduced unit costs in high-volume production. Excimer lasers meet the requirements for clean and precise structuring and enable the smallest structures in an efficient way. The latest technical developments in high power excimer lasers is bound to take cost-efficient UV-laser micro processing to the next level and bridges the gap between achievable precision and achievable throughput. New excimer laser developments and beam concepts together with latest performance data for upscaling both UV power and UV pulse energy will be the topic of this paper against the background of upcoming market trends and high volume applications.

Conference Presentation

Citation Download Citation

Ralph Delmdahl, Oliver Haupt, Igor Bragin, and Hans-Stephan Albrecht "Power and pulse energy scaling for high-volume UV-laser microprocessing", Proc. SPIE 10092, Laser-based Micro- and Nanoprocessing XI, 1009215 (17 February 2017); https://doi.org/10.1117/12.2256018

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