Ultra-short pulse laser micro patterning with highest throughput by utilization of a novel multi-beam processing head

Oliver Homburg; Manfred Jarczynski; Thomas Mitra; Stephan Brüning

doi:10.1117/12.2255707

17 February 2017 Ultra-short pulse laser micro patterning with highest throughput by utilization of a novel multi-beam processing head

Oliver Homburg, Manfred Jarczynski, Thomas Mitra, Stephan Brüning

Author Affiliations +

Proceedings Volume 10092, Laser-based Micro- and Nanoprocessing XI; 100921C (2017) https://doi.org/10.1117/12.2255707
Event: SPIE LASE, 2017, San Francisco, California, United States

Abstract

In the last decade much improvement has been achieved for ultra-short pulse lasers with high repetition rates. This laser technology has vastly matured so that it entered a manifold of industrial applications recently compared to mainly scientific use in the past. Compared to ns-pulse ablation ultra-short pulses in the ps- or even fs regime lead to still colder ablation and further reduced heat-affected zones. This is crucial for micro patterning when structure sizes are getting smaller and requirements are getting stronger at the same time. An additional advantage of ultra-fast processing is its applicability to a large variety of materials, e.g. metals and several high bandgap materials like glass and ceramics.

One challenge for ultra-fast micro machining is throughput. The operational capacity of these processes can be maximized by increasing the scan rate or the number of beams – parallel processing. This contribution focuses on process parallelism of ultra-short pulsed lasers with high repetition rate and individually addressable acousto-optical beam modulation. The core of the multi-beam generation is a smooth diffractive beam splitter component with high uniform spots and negligible loss, and a prismatic array compressor to match beam size and pitch. The optical design and the practical realization of an 8 beam processing head in combination with a high average power single mode ultra-short pulsed laser source are presented as well as the currently on-going and promising laboratory research and micro machining results. Finally, an outlook of scaling the processing head to several tens of beams is given.

Conference Presentation

Citation Download Citation

Oliver Homburg, Manfred Jarczynski, Thomas Mitra, and Stephan Brüning "Ultra-short pulse laser micro patterning with highest throughput by utilization of a novel multi-beam processing head", Proc. SPIE 10092, Laser-based Micro- and Nanoprocessing XI, 100921C (17 February 2017); https://doi.org/10.1117/12.2255707

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