Presentation + Paper
3 April 2017 Optimization of complex high-dimensional layout configurations for IC physical designs using graph search, data analytics, and machine learning
Author Affiliations +
Abstract
A typical new IC design has millions of layout configurations, not seen on previous product or test chip designs. Knowing the disposition of each and every configuration, problematic or not, is the key to optimizing design for yield. In this paper, we present a method to systematically characterize the configuration coverage of any layout. Coverage can be compared between designs, and configurations for which there is a lack of coverage can also be computed. When combined with simulation, metrology, and defect data for some configurations, graph search and machine learning algorithms can be applied to optimize designs for manufacturing yield.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vito Dai, Edward Kah Ching Teoh, Ji Xu, and Bharath Rangarajan "Optimization of complex high-dimensional layout configurations for IC physical designs using graph search, data analytics, and machine learning", Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 1014808 (3 April 2017); https://doi.org/10.1117/12.2262146
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Optical proximity correction

Manufacturing

Product engineering

Databases

Machine learning

Analytics

Lithography

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