LMS IPRO: Enabling local registration measurements for efficient e-beam writer correction

Hendrik Steigerwald; Oliver Ache; Runyuan Han; Frank Laske; Klaus-Dieter Roeth

doi:10.1117/12.2303959

13 March 2018 LMS IPRO: Enabling local registration measurements for efficient e-beam writer correction

Hendrik Steigerwald, Oliver Ache, Runyuan Han, Frank Laske, Klaus-Dieter Roeth

Proceedings Volume 10585, Metrology, Inspection, and Process Control for Microlithography XXXII; 105851V (2018) https://doi.org/10.1117/12.2303959
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Mask registration data are presented, which demonstrate local errors that can be correlated to writing swathes of state-of-the-art e-beam writers and multi-pass strategies. A unique measurement methodology, Local Registration Metrology, allows for dense sampling of reticle dies to characterize the local e-beam registration error and enables e-beam corrections via feed forward.

Citation Download Citation

Hendrik Steigerwald, Oliver Ache, Runyuan Han, Frank Laske, and Klaus-Dieter Roeth "LMS IPRO: Enabling local registration measurements for efficient e-beam writer correction", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105851V (13 March 2018); https://doi.org/10.1117/12.2303959

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