Paper
13 March 2018 Improved airborne molecular contaminant filter performance for photolithography
Author Affiliations +
Abstract
Airborne molecular contaminants continue to pose cost of ownership challenges in photolithography. Recent advances in understanding siloxane removal have led to the development of an innovative filtration configuration utilizing new media that works in concert to increase overall filter life for acids, bases and silicon containing organic contaminants. This paper examines accelerated testing results, for these state-of-the-art filtration assemblies versus legacy products, to demonstrate improved system performance. The state-of-the-art filtration assemblies have been evaluated in production semiconductor fabs and have shown favorable performance.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gerald Weineck, Brian Hoang, and Joshua Lais "Improved airborne molecular contaminant filter performance for photolithography", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105861A (13 March 2018); https://doi.org/10.1117/12.2297034
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KEYWORDS
Carbon

Silicon

Contamination

Optical lithography

Semiconductors

Gases

Chemistry

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