Even if the dimensions to consider are higher than in advanced IC nodes, microlenses are sensitive to process variability during lithography and reflow. A good control of the microlens dimensions is key to optimize the process and thus the performance of the final product. The purpose of this paper is to apply SEM contour metrology [1, 2, 3, 4] to microlenses in order to develop a relevant monitoring methodology and to propose new metrics to engineers to evaluate their process or optimize the design of the microlens arrays. |
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CITATIONS
Cited by 1 scholarly publication.
Microlens
Scanning electron microscopy
Image processing
Metrology
Photodiodes
Quantum efficiency
CMOS sensors