Recombination And Dissociative Recombination Of H[sub]2[/sub][sup]+[/sup] And H[sub]3[/sub][sup]+[/sup] Ions On Surfaces With Application To Hydrogen Negative Ion Sources

J. R. Hiskes; A. M. Karo

doi:10.1117/12.951838

25 July 1989 Recombination And Dissociative Recombination Of H₂⁺ And H₃⁺ Ions On Surfaces With Application To Hydrogen Negative Ion Sources

J. R. Hiskes, A. M. Karo

Author Affiliations +

Proceedings Volume 1061, Microwave and Particle Beam Sources and Directed Energy Concepts; (1989) https://doi.org/10.1117/12.951838
Event: OE/LASE '89, 1989, Los Angeles, CA, United States

Abstract

A four-step model for recombination and dissociative recombination of H2+ and H3+ ions on metal surfaces is discussed. Vibrationally excited molecules, H2(v''), from H3+ recombination are produced in a broad spectrum that enhances the excited level distribution. The application of this latter process to hydrogen negative ion discharges is discussed.

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J. R. Hiskes and A. M. Karo "Recombination And Dissociative Recombination Of H₂⁺ And H₃⁺ Ions On Surfaces With Application To Hydrogen Negative Ion Sources", Proc. SPIE 1061, Microwave and Particle Beam Sources and Directed Energy Concepts, (25 July 1989); https://doi.org/10.1117/12.951838

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