Surface Production Of Negative Hydrogen Ions

M. Seidl; W. E. Carr; S. T. Melnychuk; A. E. Souzis; J. Isenberg; H. Huang

doi:10.1117/12.951839

25 July 1989 Surface Production Of Negative Hydrogen Ions

M. Seidl, W. E. Carr, S. T. Melnychuk, A. E. Souzis, J. Isenberg, H. Huang

Proceedings Volume 1061, Microwave and Particle Beam Sources and Directed Energy Concepts; (1989) https://doi.org/10.1117/12.951839
Event: OE/LASE '89, 1989, Los Angeles, CA, United States

Abstract

Negative hydrogen ions are produced by electron tunnelling from a solid surface (converter) to hydrogen atoms moving away from the surface. A simple theoretical model of this process indicates reasonable ionization probability (>0.1) for low initial energy of the H atoms (order of 1 eV) when the work function of the converter is smaller than 1.5 eV. Low initial energy guarantees low H- ion energy spread. It also makes it possible to use a variety of compounds for reducing the converter work function. Experimental studies of Cs oxide films (work function 0.9 to 1.2 eV) are presented. Production of H- ions by backscattering thermally produced H atoms from a thick film of Cs oxide is demonstrated.

Citation Download Citation

M. Seidl, W. E. Carr, S. T. Melnychuk, A. E. Souzis, J. Isenberg, and H. Huang "Surface Production Of Negative Hydrogen Ions", Proc. SPIE 1061, Microwave and Particle Beam Sources and Directed Energy Concepts, (25 July 1989); https://doi.org/10.1117/12.951839

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