Based on industrial inspection of the UV double-telecentric lens design

Feng Lin

doi:10.1117/12.2506597

18 January 2019 Based on industrial inspection of the UV double-telecentric lens design

Feng Lin

Proceedings Volume 10839, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment; 108391G (2019) https://doi.org/10.1117/12.2506597
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

In order to meet the requirements of high precision and high resolution in industrial inspection, this article designed a set of UV double-telecentric lenses with wide spectrum, low distortion, low magnification, and high resolution according to market requirements. Its design requirements are: UV dual-telecentric lens with working wavelength of 240nm-320nm, working distance of 98.7mm, working F number of 8, telecentricity of less than 1°, magnification of 0.241, and total system length of less than 160mm. This design takes into account the combination of cost and image quality, and finally adopts a global surface transmissive and non-glued solution. The system adopts double Gaussian as the initial structure, uses Zemax optical software to design; analyzes the tolerances of the design results based on the process requirements, determines the source of the tolerance error, and optimizes the related structure, finally designing the full-field modulation transfer function. (MTF) UV double-telecentric lens with diffraction limit up to 0.08% distortion. Compared with other UV systems, this system has the advantages of high imaging quality, high resolution, low distortion, and good telecentricity.

Citation Download Citation

Feng Lin "Based on industrial inspection of the UV double-telecentric lens design", Proc. SPIE 10839, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 108391G (18 January 2019); https://doi.org/10.1117/12.2506597

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KEYWORDS

Ultraviolet radiation

Tolerancing

Imaging systems

Lens design

Chromatic aberrations

Image quality

Optical design

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