Effect of Ar ion-plasma treatment on residual stress in thin Cr films

A. Babushkin; R. Selyukov; I. Amirov

doi:10.1117/12.2521617

15 March 2019 Effect of Ar ion-plasma treatment on residual stress in thin Cr films

A. Babushkin, R. Selyukov, I. Amirov

Proceedings Volume 11022, International Conference on Micro- and Nano-Electronics 2018; 1102223 (2019) https://doi.org/10.1117/12.2521617
Event: The International Conference on Micro- and Nano-Electronics 2018, 2018, Zvenigorod, Russian Federation

Abstract

The results of investigation of the effect of ion-plasma treatment in Ar plasma with ion energies ε_i = 15-30 eV on residual stress in thin Cr films are presented. Mean stress depending on ε_i and treatment time t was determined using Xray diffractometry and test microbridges, stress gradient was determined using test microcantilevers. The Cr films initially had compressive stress and a positive value of the stress gradient that is they had greater compressive stress near the interface than near the surface. The treatments at ε_i = 15-25 eV, t = 15-45 min led to increase in compressive stress. The treatments of Cr films at ε_i = 25-30 eV, t = 60 min led to decrease of the initial compressive stress. The stress gradient after ion-plasma treatment at εi above 15 eV increased. The higher the ion energy or the longer the treatment time, the greater the value of the stress gradient.

Citation Download Citation

A. Babushkin, R. Selyukov, and I. Amirov "Effect of Ar ion-plasma treatment on residual stress in thin Cr films", Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 1102223 (15 March 2019); https://doi.org/10.1117/12.2521617

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