Determination of alternative monitoring wavelength to increase the accuracy of measuring the layers thickness during the thin films manufacture

Thai Phi Ngo; L. A. Gubanova; Van Hoa Pham

doi:10.1117/12.2525356

21 June 2019 Determination of alternative monitoring wavelength to increase the accuracy of measuring the layers thickness during the thin films manufacture

Thai Phi Ngo, L. A. Gubanova, Van Hoa Pham

Author Affiliations +

Proceedings Volume 11057, Modeling Aspects in Optical Metrology VII; 1105719 (2019) https://doi.org/10.1117/12.2525356
Event: SPIE Optical Metrology, 2019, Munich, Germany

Abstract

Currently, there are various methods to control the layers thicknesses during their manufacture and optical monitoring method is the basically used most often today. In this paper, we consider a method for determining the monitoring wavelength to control the optical thickness of each layer during its fabrication. By applying the method, it is possible to reduce errors in layer thicknesses and to obtain the spectral characteristic of the transmittance (or reflection) of the experimental coating that is maximally close to the theoretical spectra. The experimental results of thin films with high spectral performance showed that the method can effectively reduce the errors in layers thickness.

Citation Download Citation

Thai Phi Ngo, L. A. Gubanova, and Van Hoa Pham "Determination of alternative monitoring wavelength to increase the accuracy of measuring the layers thickness during the thin films manufacture", Proc. SPIE 11057, Modeling Aspects in Optical Metrology VII, 1105719 (21 June 2019); https://doi.org/10.1117/12.2525356

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