Silicon-based metasurfaces for vortex beam generation

Raghu Dharmavarapu; Soon Hock Ng; Shanti Bhattacharya; Saulius Juodkazis

doi:10.1117/12.2541234

31 December 2019 Silicon-based metasurfaces for vortex beam generation

Raghu Dharmavarapu, Soon Hock Ng, Shanti Bhattacharya, Saulius Juodkazis

Proceedings Volume 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019; 112011T (2019) https://doi.org/10.1117/12.2541234
Event: ANZCOP, 2019, Melbourne, Australia

Abstract

Silicon metasurfaces were fabricated on fused silica substrates by using sputtering, electron beam lithography and reactive ion etching. A chromium etch mask was used to protect the silicon during plasma etching. We designed a hologram with phase range of 0 - 1.17π to generate a higher order Bessel beam. The device produced the expected beam profile and the presence of charge 3 was confirmed using a interference test. Tests on spiral plate devices were less successful owing to the thickness non-uniformity in the sputtered Si film.

Citation Download Citation

Raghu Dharmavarapu, Soon Hock Ng, Shanti Bhattacharya, and Saulius Juodkazis "Silicon-based metasurfaces for vortex beam generation", Proc. SPIE 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019, 112011T (31 December 2019); https://doi.org/10.1117/12.2541234

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