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9 March 2020 High LIDT photosensitive organic-inorganic hybrid materials for nanoimprint lithography (Conference Presentation)
Maria Farsari, Areti Mourka, Vasileia Melissinaki, Dimitris G. Papazoglou, Theodoros Tachtsidis, Andrius Melninkaitis
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Proceedings Volume 11269, Synthesis and Photonics of Nanoscale Materials XVII; 112690A (2020) https://doi.org/10.1117/12.2544705
Event: SPIE LASE, 2020, San Francisco, California, United States
Abstract
Nanoimprint lithography (NIL) is a technique suitable for the mass production of micro-optical elements using a mould. One drawback, however, is that the materials used in NIL have low laser-induced damage threshold (LIDT). Here, we present our results in the development of a series of high-LIDT organic-inorganic hybrid materials, and their application in NIL using moulds made by multiphoton lithography.
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Maria Farsari, Areti Mourka, Vasileia Melissinaki, Dimitris G. Papazoglou, Theodoros Tachtsidis, and Andrius Melninkaitis "High LIDT photosensitive organic-inorganic hybrid materials for nanoimprint lithography (Conference Presentation)", Proc. SPIE 11269, Synthesis and Photonics of Nanoscale Materials XVII, 112690A (9 March 2020); https://doi.org/10.1117/12.2544705
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KEYWORDS
Nanoimprint lithography
Organic hybrid materials
Laser damage threshold
Laser induced damage
Multiphoton lithography
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