EUV mask polarization effects on sub-7nm node imaging

Lilian Neim; Bruce W. Smith; Germain Fenger

doi:10.1117/12.2553232

23 March 2020 EUV mask polarization effects on sub-7nm node imaging

Lilian Neim, Bruce W. Smith, Germain Fenger

Proceedings Volume 11323, Extreme Ultraviolet (EUV) Lithography XI; 1132314 (2020) https://doi.org/10.1117/12.2553232
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

As extreme ultraviolet lithography (EUVL) technology progresses towards and below sub-7nm generations, polarization effects will begin to have an impact. Moving to higher NA will introduce polarization effects at all locations: the mask plane, the optics, and the image plane. Contrast losses at a larger angle can occur from the interference at the image plane that will become significant for smaller geometries approaching the EUVL wavelength. Some of these contrast losses can occur at the mask where the polarized reflectance from an EUV mask is affected by the multilayer reflective stack and patterned features. This paper explores the polarization effects that are induced by EUVL masks for sub-7nm lithography. The results show a polarization-dependent induction and attenuation of current in EUVL mask structures, especially as mask pitch decreases below 6λ.

Conference Presentation

Citation Download Citation

Lilian Neim, Bruce W. Smith, and Germain Fenger "EUV mask polarization effects on sub-7nm node imaging", Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 1132314 (23 March 2020); https://doi.org/10.1117/12.2553232

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