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20 March 2020 On-product focus monitoring and control for immersion lithography in 3D-NAND manufacturing
Amine Lakcher, Ahmed Zayed, Jennifer Shumway, Jan-Pieter van Delft, Gratiela Isai, Ruxandra Mustata, Arno van den Brink, Taeddy Kim, Jay Jung, Yong-Sik Shin, Soo-Kyung Lee, Paul Böcker, Mohamed El Kodadi, Geert Vinken, ChanHa Park, Sangjun Han, Jeongsu Park, Beomki Shin, Gunwoong Lee
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Proceedings Volume 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV; 1132521 (2020) https://doi.org/10.1117/12.2552930
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States
Abstract
The market transition from 2D to 3D-NAND in recent years requires strict focus control and monitoring solutions. ASML’s μDBF targets (micro Diffraction Based Focus) enable on-product focus measurement which can be used to optimize scanner correction. Additionally, dense computational focus maps can be generated by combining μDBF measurements with scanner metrology such as non-correctable leveling error. This paper discusses the focus variability observed on memory layers through on product focus monitoring. This work will show how exposure at best focus can be performed for immersion lithography in the case of strong focus fingerprints. Focus monitoring data from μDBF and computational focus metrology will be used to generate and apply corrections on two 3D-NAND layers.
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Amine Lakcher, Ahmed Zayed, Jennifer Shumway, Jan-Pieter van Delft, Gratiela Isai, Ruxandra Mustata, Arno van den Brink, Taeddy Kim, Jay Jung, Yong-Sik Shin, Soo-Kyung Lee, Paul Böcker, Mohamed El Kodadi, Geert Vinken, ChanHa Park, Sangjun Han, Jeongsu Park, Beomki Shin, and Gunwoong Lee "On-product focus monitoring and control for immersion lithography in 3D-NAND manufacturing", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 1132521 (20 March 2020); https://doi.org/10.1117/12.2552930
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KEYWORDS
Semiconducting wafers
Metrology
Scanners
Immersion lithography
Critical dimension metrology
Lithography
Lithographic process control
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