A New Fabrication Process For Compact Disk

P. Briaud; R. E. Revay; L. Le Dreau

doi:10.1117/12.961743

11 October 1989 A New Fabrication Process For Compact Disk

P. Briaud, R. E. Revay, L. Le Dreau

Proceedings Volume 1138, Optical Microlithography and Metrology for Microcircuit Fabrication; (1989) https://doi.org/10.1117/12.961743
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

Grooved glass substrates for use in media directly readable with optical disks players (CD-audio,CD-ROM, WORM or erasable disks) are fabricated with conventional UV photolithography and etching techniques. The mask preparation is made by compact disk mastering equipment. After exposure and development of the photoresist, etching of the glass disk is done. The quality of the replication and of the etching process can be judged only by the undamental quality criteria (block error rate) of the compact disk. If any region of the replica is unacceptable, the disk must be rejected.

Citation Download Citation

P. Briaud, R. E. Revay, and L. Le Dreau "A New Fabrication Process For Compact Disk", Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); https://doi.org/10.1117/12.961743

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