Paper
27 November 1989 Industrial Manufacturing Of Multilayers Mirrors For X-Ray Optics
P. Davi
Author Affiliations +
Abstract
In order to extend the variety of its optical coatings, MATRA has launched out into realization of selective multilayer mirrors in the X-UV spectral range. MATRA already owned the manufacturing means, a radiofrequency sputtering plant equiped so as to make homogeneous deposition of multilayer coatings in a completely automatic process, simultaneously on several substrates of diameter up to 80mm. The mean of control after deposition consists in an X-Ray goniometer working at the wavelength of 1.54 Å, developed according to an original conception by the "Institut d'Optique Theorique et Appliquee". This measuring bench permits to obtain a precise value of the period of the multilayer and its mean index at the wavelength of 1.54 Å. These means of manufacturing and control permit to realize multilayers selective mirrors for wavelength down to 1 Å with periods down to approximately 30 Å. A very powerfull program of calculation determines the best multilayer adapted to a given problem, taking account of variation of complex index with wavelength, incidence and polarization. Three couples of materials are used up to now, which are carbon-tungsten, silicon-tungsten and carbon-nolybdenum, and the first results of absolute reflectivity are encouraging. Others materials are planned to be used to respond to most specific problems.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Davi "Industrial Manufacturing Of Multilayers Mirrors For X-Ray Optics", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); https://doi.org/10.1117/12.961878
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Cited by 1 scholarly publication.
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KEYWORDS
Multilayers

Reflectivity

X-rays

Mirrors

Sputter deposition

Manufacturing

Polarization

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