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22 February 2021 Nanoimprint template development by new fabrication method and its application
Koji Ichimura, Takaharu Nagai, Kouji Yoshida, Hisayoshi Watanabe, Naoya Hayashi
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Proceedings Volume 11610, Novel Patterning Technologies 2021; 116100B (2021) https://doi.org/10.1117/12.2584791
Event: SPIE Advanced Lithography, 2021, Online Only
Abstract
Nanoimprint lithography, NIL, has been developed for semiconductor lithography technology. Recently three dimensional imprint such as dual damascene pattern fabrication by NIL is proposed. For fine feature templates, double patterning process is proposed for template fabrication. For both application, two or more E-beam writing is required in the template fabrication and the overlay of second writing against first layer is important. In the presentation, we will discuss overlay of E-beam writing in NIL template fabrication.
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Koji Ichimura, Takaharu Nagai, Kouji Yoshida, Hisayoshi Watanabe, and Naoya Hayashi "Nanoimprint template development by new fabrication method and its application", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100B (22 February 2021); https://doi.org/10.1117/12.2584791
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KEYWORDS
Nanoimprint lithography
Lithography
Double patterning technology
Fabrication
Overlay metrology
Photomasks
Polymers
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