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5 March 2021 Al film patterning on poly-carbonate by F2 laser irradiation
Tsuyoshi Yoshida, Hidetoshi Nojiri, Masayuki Okoshi
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Proceedings Volume 11673, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI; 1167312 (2021) https://doi.org/10.1117/12.2577070
Event: SPIE LASE, 2021, Online Only
Abstract
In recent years, polycarbonate (=PC) is gathering attention as a light and strong material for smart windows. In the presentation, a patterning method of Al deposited film on silicone hard-coated polycarbonate by 157 nm F2 laser irradiation will be reported. A photomask placed on Al thin film and irradiated by F2 laser and the non-irradiated area was removed by KOH aq. The mechanism of the patterning will be discussed based on XPS, AFM, and ATR-FTIR measurement.
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Tsuyoshi Yoshida, Hidetoshi Nojiri, and Masayuki Okoshi "Al film patterning on poly-carbonate by F2 laser irradiation", Proc. SPIE 11673, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI, 1167312 (5 March 2021); https://doi.org/10.1117/12.2577070
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KEYWORDS
Aluminum
Laser irradiation
Optical lithography
Silicon
Silicon films
Thin film coatings
Interfaces
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