From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography

T. Allenet; T. Mortelmans; M. Vockenhuber; C-K. Yeh; Y. Ekinci

doi:10.1117/12.2600920

21 December 2021 From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography

T. Allenet, T. Mortelmans, M. Vockenhuber , C-K. Yeh, Y. Ekinci

Author Affiliations +

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 1185417 (2021) https://doi.org/10.1117/12.2600920
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Conference Poster

Abstract

As EUV lithography becomes the new standard for electronic chip manufacturing, identifying suitable materials for higher resolution patterning stands out as a prominent challenge to reach future technology nodes. Innovative approaches to patterning are becoming more and more relevant as conventionally used photoresists approach their limitations. In this work we use the Interference Lithography tool at the Paul Scherrer Institute (Swiss Light Source) for screening of EUV Lithography materials. We highlight the EUV lithography exposure mechanism of secondary electron chemistry and its versatility in inducing a solubility switch in photosensitive materials by using a chicken egg-white albumin protein cluster as a resist to obtain sub-100 nm patterns.

Conference Presentation

Citation Download Citation

T. Allenet, T. Mortelmans, M. Vockenhuber , C-K. Yeh, and Y. Ekinci "From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 1185417 (21 December 2021); https://doi.org/10.1117/12.2600920

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