Measurement of highly reflective surface compensating correlated error by sampling window

Jurim Jeon; Sungtae Kim; Yangjin Kim

doi:10.1117/12.2607582

5 March 2022 Measurement of highly reflective surface compensating correlated error by sampling window

Jurim Jeon, Sungtae Kim, Yangjin Kim

Proceedings Volume 12008, Photonic Instrumentation Engineering IX; 120080T (2022) https://doi.org/10.1117/12.2607582
Event: SPIE OPTO, 2022, San Francisco, California, United States

Conference Poster

Abstract

Wavelength-tuning Fizeau interferometer has been widely applied to measurements of optical surfaces. However, when measuring highly reflective surfaces, such as silicon wafer surfaces, a coupling error between higher harmonics and phase-shift miscalibration, can cause a significant systematic error in the calculated phase. In this study, a new 11-frame phase-extraction algorithm is derived for the suppression of the coupling error. The 11-frame algorithm was visualized in the frequency domain and complex plane, and its compensation capability was confirmed by numerical error analysis. Finally, the surface shape of the silicon wafer was measured by applying the 11-frame algorithm and Fizeau interferometer.

Citation Download Citation

Jurim Jeon, Sungtae Kim, and Yangjin Kim "Measurement of highly reflective surface compensating correlated error by sampling window", Proc. SPIE 12008, Photonic Instrumentation Engineering IX, 120080T (5 March 2022); https://doi.org/10.1117/12.2607582

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