Presentation + Paper
2 December 2022 Glass-engraved metasurfaces: the path to ultra-low reflectance, extreme broadband performance, and high acceptance angle for high power laser applications
Author Affiliations +
Abstract
Recent work utilizing metal etching masks to fabricate substrate-engraved metasurfaces have been handicapped by the available etching depth, restricting the bandwidth of antireflective performance. Advances made to etch mask technology to facilitate deeper etching will be discussed here, and the taller ensuant metasurface features will be presented. The antireflective performance of these high aspect ratio structures (broad acceptance angles and broadband antireflective performance for both polarizations) will be discussed.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nathan J. Ray, Jae-Hyuck Yoo, Hoang T. Nguyen, Michael A. Johnson, and Eyal Feigenbaum "Glass-engraved metasurfaces: the path to ultra-low reflectance, extreme broadband performance, and high acceptance angle for high power laser applications", Proc. SPIE 12300, Laser-Induced Damage in Optical Materials 2022, 1230009 (2 December 2022); https://doi.org/10.1117/12.2641631
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KEYWORDS
Reflectivity

Etching

Dewetting

Nanoparticles

Antireflective coatings

Silica

Gold

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