Monolithic coupling between high- and mid-index, multi-micron waveguides for O-band applications

Ilias Skandalos; Thalía Domínguez Bucio; Lorenzo Mastronardi; Yaonan Hou; Teerapat Rutirawut; Frederic Gardes

doi:10.1117/12.2648634

13 March 2023 Monolithic coupling between high- and mid-index, multi-micron waveguides for O-band applications

Ilias Skandalos, Thalía Domínguez Bucio, Lorenzo Mastronardi, Yaonan Hou, Teerapat Rutirawut, Frederic Gardes

Proceedings Volume 12426, Silicon Photonics XVIII; 124260K (2023) https://doi.org/10.1117/12.2648634
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

In this work, a coupling strategy between mid-index SiNx and high-index active waveguides on the same silicon chip is proposed. To that aim, a sophisticated proof-of-concept integration between N-rich SiN and SOI micrometric waveguides is demonstrated achieving a <0.5 dB coupling for both TE/TM polarisations. The optical tunability of SiNx allows the mitigation of the mid-high refractive index discrepancy by interposing a SiO₂/Si-rich SiN double-layer anti-reflective coating, attaining back-reflections close to −20 dB. On that basis, it is shown numerically that a sub-dB interconnection between multiple-quantum well/dot stratified stacks and a silicon nitride passive waveguide is achievable, while keeping the introduced back-reflection level below −30 dB.

Conference Presentation

Citation Download Citation

Ilias Skandalos, Thalía Domínguez Bucio, Lorenzo Mastronardi, Yaonan Hou, Teerapat Rutirawut, and Frederic Gardes "Monolithic coupling between high- and mid-index, multi-micron waveguides for O-band applications", Proc. SPIE 12426, Silicon Photonics XVIII, 124260K (13 March 2023); https://doi.org/10.1117/12.2648634

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