High transfer fidelity via nanoimprint lithography of patterns for bioelectronics applications

P. Güell-Grau; M. Asbahi; S. Smout; M. Willegems; B. K. Kotowska; M. C. Traub; S. Lenci; E. Storace; S. Severi

doi:10.1117/12.2657991

30 April 2023 High transfer fidelity via nanoimprint lithography of patterns for bioelectronics applications

P. Güell-Grau, M. Asbahi, S. Smout, M. Willegems, B. K. Kotowska, M. C. Traub, S. Lenci, E. Storace, S. Severi

Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970C (2023) https://doi.org/10.1117/12.2657991
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Precise control on nanoscale pattern manufacturing is key to enable new-generation devices in numerous fields, such as bioelectronics or optics, among others. However, to meet the requirements of the industry, it is especially relevant to increase throughput and reduce processing costs. In this regard, Nano-Imprint Lithography (NIL) is an ideal candidate for manufacturing large volumes of devices with low cost-of-ownership, by replicating small features from high-quality masters. However, NIL faces some challenges, such as limited pattern transfer fidelity in large-area processing. Here, we show our NIL processing capabilities, in terms of both yield and transfer fidelity from original DUV manufactured masters, including features from few hundred to tens of nanometers. We present an exhaustive study on the pattern evolution through the complete process, including design, master fabrication, NIL and subsequent pattern transfer via etching. This study demonstrates the inclusion of NIL into our foundry-mature, CMOS-compatible process modules as well as the pattern evolution characterization that enable technology-aware modelling and designing.

Conference Presentation

Citation Download Citation

P. Güell-Grau, M. Asbahi, S. Smout, M. Willegems, B. K. Kotowska, M. C. Traub, S. Lenci, E. Storace, and S. Severi "High transfer fidelity via nanoimprint lithography of patterns for bioelectronics applications", Proc. SPIE 12497, Novel Patterning Technologies 2023, 124970C (30 April 2023); https://doi.org/10.1117/12.2657991

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