Reduction lens and illumination system for deep-UV aligners

Juergen W. Liegel; Gerhard P. Ittner; Erhard Glatzel; Johannes Wangler

doi:10.1117/12.20209

1 June 1990 Reduction lens and illumination system for deep-UV aligners

Juergen W. Liegel, Gerhard P. Ittner, Erhard Glatzel, Johannes Wangler

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20209
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

The optical equipment for DUV-Aligners consisting of an all-quartz lens and an illumination system for a 248 nm narrowband excimer laser has been developed. First the concept of the illumination system is discussed. It was possible to achieve good illumination homogeneity in reticle and pupil planes combined with a reasonable efficiency. Data on illumination intensity and homogeneity is reported. An all-quartz lens which cannot be chromatically corrected has been designed and tested. The 5 : 1 reduction lens has a NA of 0. 42 and can print 0. 5 iim lines and spaces over a field diameter of 21. 2 mm. To obtain diffraction limited resolution a spectral bandwidth of 3 pm is required. Experimental data on optical performance is presented. Changes in environmental conditions can be compensated and do not influence the imaging quality. 1.

Citation Download Citation

Juergen W. Liegel, Gerhard P. Ittner, Erhard Glatzel, and Johannes Wangler "Reduction lens and illumination system for deep-UV aligners", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20209

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