High-resolution large-area patterning of photonic structures using a multibeam direct write laser lithography technology

Kahraman Keskinbora; Niek Kremers; Jan Aarts; Hendrik Postma; Viacheslav Vlasenko; Jacco Houter

doi:10.1117/12.2677334

26 September 2023 High-resolution large-area patterning of photonic structures using a multibeam direct write laser lithography technology

Kahraman Keskinbora, Niek Kremers, Jan Aarts, Hendrik Postma, Viacheslav Vlasenko, Jacco Houter

Author Affiliations +

Proceedings Volume 12667, Laser Beam Shaping XXIII; 126670B (2023) https://doi.org/10.1117/12.2677334
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States

Abstract

In this work, we report on the results obtained using a multibeam direct-write laser lithography technology for the fabrication of sub-micron photonic structures. This approach uses a state-of-the-art tool that simultaneously offers highthroughput and high-resolution fabrication capabilities for scalable nanotechnology applications. We demonstrate the capabilities of the multibeam laser lithography by optimizing and fabricating an anti-dot array. We show that our technology is capable of producing structures with feature sizes as small as 300 nm with high fidelity and uniformity. Moreover, we investigate the influence of various parameters, such as laser power, and focus settings on the resolution and quality of the fabricated structures. The potential of the multibeam laser lithography is further demonstrated for the exposure of large surface areas by fabricating a 12 cm x 12 cm photonic crystal array with critical dimensions of 600 nm. The uniformity and periodicity over the entire area are both investigated by extensive metrology, demonstrating high scalability. Overall, our results highlight the potential of multibeam laser lithography as a powerful method for industrial scale nanotechnology. The technique offers great versatility, making it an ideal tool for various applications in various fields of optics, from wafer-level integrated photonics to photonic bandgap structures, and from displays to large area Xray optics.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Kahraman Keskinbora, Niek Kremers, Jan Aarts, Hendrik Postma, Viacheslav Vlasenko, and Jacco Houter "High-resolution large-area patterning of photonic structures using a multibeam direct write laser lithography technology", Proc. SPIE 12667, Laser Beam Shaping XXIII, 126670B (26 September 2023); https://doi.org/10.1117/12.2677334

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