System for high-sensitivity measurement of birefringence using a photoelastic modulator, and its applications

Niall O'Flaherty; Naoshi Kiyomoto; Ichiro Shirahama; Yoshihiro Mochida

doi:10.1117/12.20490

1 August 1990 System for high-sensitivity measurement of birefringence using a photoelastic modulator, and its applications

Niall O'Flaherty, Naoshi Kiyomoto, Ichiro Shirahama, Yoshihiro Mochida

Author Affiliations +

Proceedings Volume 1274, Electro-Optic and Magneto-Optic Materials II; (1990) https://doi.org/10.1117/12.20490
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

The construction and applications of a system for measuring optical birefringence are described. As the system utilizes a photo-elastic modulator for the modulation of incident linearly polarized light, measured data includes not only high resolu- tion of birefringence retardation but also a direction of fast axis of retardation which corresponds to the direction of molecular orientation. The resolution of measured birefringence of this system is i08. As this system is designed for the study of the three-dimensional anisotropic properties and molecular orientation of glass, polymer films and ultra thin organic films such as Langmuir-Brodgett films, some of its applications are discussed.

Citation Download Citation

Niall O'Flaherty, Naoshi Kiyomoto, Ichiro Shirahama, and Yoshihiro Mochida "System for high-sensitivity measurement of birefringence using a photoelastic modulator, and its applications", Proc. SPIE 1274, Electro-Optic and Magneto-Optic Materials II, (1 August 1990); https://doi.org/10.1117/12.20490

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