Multibeam fracture flow based on multigon format input

Apurva Bajpai; Rachit Sharma; Bhardwaj Durvasula; Ranganadh Peespati; Sayalee Gharat; Stephen Kim

doi:10.1117/12.2687753

21 November 2023 Multibeam fracture flow based on multigon format input

Apurva Bajpai, Rachit Sharma, Bhardwaj Durvasula, Ranganadh Peespati, Sayalee Gharat, Stephen Kim

Proceedings Volume 12751, Photomask Technology 2023; 127510A (2023) https://doi.org/10.1117/12.2687753
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

With the advent of advanced nodes, curvilinear mask processing is becoming the convention. Adopting complex curvilinear shapes for modern photomasks using ILT (Inverse Lithography Technique) may aid the pattern fidelity of complex designs. The curvilinear working group has convened on the addition of the MULTIGON record to the OASIS format. MULTIGON is accepted as a preliminary standard in OASIS format for the exploration of new flows and their advantages. Multibeam mask writers are becoming the standard solution at advanced nodes due to their constant write time and ability to pattern complex designs. Multibeam fracture will be pivotal in the MULTIGON based data preparation flows. In this paper, we demonstrate the readiness of Calibre multibeam fracture tools to accept MULTIGON input and generate fractured data to machine format. Existing multibeam mask writers expect Piecewise-Linear (PWL) data as input to their data path. This paper explores two different quantitative methodologies for conversion of MULTIGON input in fracture to Piecewise-Linear output, enabled by the Calibre Mask Data Preparation tools supporting multibeam fracturing. We investigate the impact of these two methodologies: edge-length based and deviation-tolerance based, while processing MULTIGON inputs, and their impact on mask contour quality. We also analyze the impact of the different sampling methods and their sampling values on the mask contour using a nominal EUV mask process model and present results related to these experiments. Consequently, we aim to deduce the acceptable sampling methods and their limits while respecting the sampling frequency described by the mask data preparation process.

Conference Presentation

Citation Download Citation

Apurva Bajpai, Rachit Sharma, Bhardwaj Durvasula, Ranganadh Peespati, Sayalee Gharat, and Stephen Kim "Multibeam fracture flow based on multigon format input", Proc. SPIE 12751, Photomask Technology 2023, 127510A (21 November 2023); https://doi.org/10.1117/12.2687753

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