Imaging study of phase shift spatial light modulator for digital scanner

Yoji Watanabe; Yuho Kanaya; Yosuke Okudaira; Shunsuke Kibayashi; Toshiaki Sakamoto; Yasushi Mizuno; Kazuo Masaki; Soichi Owa; Thomas Koo; Bryant Lin; Michael Tan; David Tseng; Conrad Sorensen; Sujuan Li; Stephen Renwick; Noriyuki Hirayanagi; Bausan Yuan

doi:10.1117/12.3010082

10 April 2024 Imaging study of phase shift spatial light modulator for digital scanner

Yoji Watanabe, Yuho Kanaya, Yosuke Okudaira, Shunsuke Kibayashi, Toshiaki Sakamoto, Yasushi Mizuno, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan

Author Affiliations +

Proceedings Volume 12953, Optical and EUV Nanolithography XXXVII; 129530R (2024) https://doi.org/10.1117/12.3010082
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Digital Scanner (DS) is an optical maskless exposure tool with a SLM (Spatial Light Modulator) and a DUV solid-state laser with wavelength of 193 or 248 nm. There are two configurations of SLM: a tilt SLM, in which each micro-mirror pixel tilts to change the amplitude of reflected light; and a piston SLM in which each micro-mirror pixel moves along optical path to change the phase of reflected light. Both types are applicable for DS, but piston SLM has a better image contrast due to strong phase shift effect. A DS proof-of-concept tool (DS-POC) with piston SLM and exposure wavelength of 193 nm was developed, which has a similar imaging resolution with the DS248, a tool planned as the first DS product for lithography of 180 nm node or below. Exposure results of 180 nm node logic patterns by DS-POC are presented. Process window analysis of the logic patterns by simulation shows better performance of piston SLM than tilt SLM on exposure latitude. CD accuracy of less than 10% was experimentally demonstrated for resolution chart of L/S with CD from 150 nm through 300 nm using piston SLM at DS-POC.

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(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Yoji Watanabe, Yuho Kanaya, Yosuke Okudaira, Shunsuke Kibayashi, Toshiaki Sakamoto, Yasushi Mizuno, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, and Bausan Yuan "Imaging study of phase shift spatial light modulator for digital scanner", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 129530R (10 April 2024); https://doi.org/10.1117/12.3010082

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