Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides

M. Greul; K. Edelmann; S. Fasold; J. Hartbaum; E. Linn; I. Stolberg; U. Weidenmueller

doi:10.1117/12.3010355

9 April 2024 Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides

M. Greul, K. Edelmann, S. Fasold, J. Hartbaum, E. Linn, I. Stolberg, U. Weidenmueller

Author Affiliations +

Proceedings Volume 12956, Novel Patterning Technologies 2024; 129560N (2024) https://doi.org/10.1117/12.3010355
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

Integrated photonics offer a miniaturization potential for applications like sensing, data communication, as well as emerging quantum technologies. In this paper we show optical loss measurements for different e-beam approximation, data preparation, and exposure strategies concerning optical waveguides. The focus is on both, the decrease of e-beam writing time and the reduction of optical loss, which is achieved by applying Vistec’s shot count optimized and edge roughness aware JES Approximation, as compared to the common Border Approximation.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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M. Greul, K. Edelmann, S. Fasold, J. Hartbaum, E. Linn, I. Stolberg, and U. Weidenmueller "Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides", Proc. SPIE 12956, Novel Patterning Technologies 2024, 129560N (9 April 2024); https://doi.org/10.1117/12.3010355

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