CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 12957 > Article
Presentation + Paper
9 April 2024 Novel spin-on overcoat materials for EUV photoresist enhancement
Xisen Hou, Yinjie Cen, Paul Baranowsky, Karen Petrillo
Author Affiliations +
Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 1295714 (2024) https://doi.org/10.1117/12.3010862
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
Extreme Ultraviolet (EUV) lithography has emerged as the state-of-the-art technology for high-resolution patterning in semiconductor manufacturing. However, several challenges persist in the performance of current EUV photoresists, particularly in improving resolution, sensitivity, and line-edge roughness (LER), and local critical dimension uniformity (LCDU). In this study, we describe a novel chemical trimming overcoat process as a highly versatile post-lithography spin-on overcoat to enhance photoresist performance in EUVL, enabling significant dose reduction and z-factor improvement.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Xisen Hou, Yinjie Cen, Paul Baranowsky, and Karen Petrillo "Novel spin-on overcoat materials for EUV photoresist enhancement", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 1295714 (9 April 2024); https://doi.org/10.1117/12.3010862
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 6 PAGES + PRESENTATION
DOWNLOAD PAPER SAVE TO MY LIBRARY
WATCH
PRESENTATION
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photoresist materials
Extreme ultraviolet lithography
Lithography
Photoresist developing
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top