Computer-optimized optical monitoring wavelengths

Ricardo Flores-Hernandez

doi:10.1117/12.22417

1 December 1990 Computer-optimized optical-monitoring wavelengths

Ricardo Flores-Hernandez

Proceedings Volume 1324, Modeling of Optical Thin Films II; (1990) https://doi.org/10.1117/12.22417
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

Experimental and computer procedures are described to calculate in advance the optimal monitoring wave lengths for each layer for any all-dielectric multilayer stack on any substrate holder configuration. Thickness ratios [tooling factors] between monitoring and working substrates are obtained experimentally to compute the spectral behavior of the irregular stack that has to be deposited on the monitoring substrate to obtain the desired, correct all-dielectric thin film stack on the working substrates. The computational algorithm takes into account the overall monitoring beam's spectral response. The results obtained are a set of possible turning-point monitoring wave lengths for each layer to be deposited and plots the transmittance or reflectance behavior of these wave lengths as a function of layer thickness growth, to allow the user to select the most convenient among them.

Citation Download Citation

Ricardo Flores-Hernandez "Computer-optimized optical-monitoring wavelengths", Proc. SPIE 1324, Modeling of Optical Thin Films II, (1 December 1990); https://doi.org/10.1117/12.22417

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