Paper
1 November 1990 Nonoptical real-time particle fallout monitor
Raymond L. Chuan, William D. Bowers
Author Affiliations +
Abstract
The paper describes a size-selective fallout monitor that can be employed to assess the degradation of sensitive optical surfaces as well as facilitate the analysis of particle types. The device combines a vertical elutriator and a quartz crystal microbalance, and only particles greater than a specific size can pass through an upward laminar flow generated in the device. The larger particles cause a frequency shift in the crystal oscillator, thereby permitting the measurement of the fallout associated with the contamination of optical instruments.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Raymond L. Chuan and William D. Bowers "Nonoptical real-time particle fallout monitor", Proc. SPIE 1329, Optical System Contamination: Effects, Measurement, Control II, (1 November 1990); https://doi.org/10.1117/12.22600
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KEYWORDS
Particles

Crystals

Contamination

Aerodynamics

Contamination control

Scanning electron microscopy

Quartz

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