Excimer and nitrogen lasers with low-average power for technology applications

Ludwik Jerzy Pokora

doi:10.1117/12.25946

1 February 1991 Excimer and nitrogen lasers with low-average power for technology applications

Ludwik Jerzy Pokora

Proceedings Volume 1397, 8th Intl Symp on Gas Flow and Chemical Lasers; (1991) https://doi.org/10.1117/12.25946
Event: Eighth International Symposium on Gas-Flow and Chemical Lasers, 1990, Madrid, Spain

Abstract

For the last few years applications of excimer lasers in technological processes aroused more and more interest. It is due to many unique UV radiation parameters of those lasers. The most important of the parameters are: ability of focusing on very small area, low diffraction in lithographic processes, non-thermal (cold) nature of interreaction with materials, significant absorptivity for most of metals.

Citation Download Citation

Ludwik Jerzy Pokora "Excimer and nitrogen lasers with low-average power for technology applications", Proc. SPIE 1397, 8th Intl Symp on Gas Flow and Chemical Lasers, (1 February 1991); https://doi.org/10.1117/12.25946

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