Highly accurate pattern generation using acousto-optical deflection

Torbjoern Sandstrom; James K. Tison

doi:10.1117/12.44829

1 July 1991 Highly accurate pattern generation using acousto-optical deflection

Torbjoern Sandstrom, James K. Tison

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44829
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A laser reticle writer for 5X reticle production using acousto-optical deflection, Micronic LRS-18, is described and discussed. Polygon scanners have higher ultimate through-put, but an acousto-optical scanner is faster at short scans. Using a short scan simplifies the optics and reduces stripe butting errors. Sub-pixel addressing is done in a single pass with no loss of writing speed. The stage has a fast return stroke and vibration-free movement. The beam position is updated at the start of every scan cycle, i.e., every 20 microsecond(s) , by inertia-free servos, and the influence of mechanical vibrations is highly suppressed. A quartz plate with a known pattern is used for calibration. Laser scanners for R&D and large-area masks are in development.

Citation Download Citation

Torbjoern Sandstrom and James K. Tison "Highly accurate pattern generation using acousto-optical deflection", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44829

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