Novolak resin design concept for high-resolution positive resists

Tsutomu Noguchi; Hidemi Tomita

doi:10.1117/12.46366

1 June 1991 Novolak resin design concept for high-resolution positive resists

Tsutomu Noguchi, Hidemi Tomita

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46366
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A new novolak-type photoresist which is applicable to excimer laser lithography has been developed. This resist consists of a naphthoquinonediazide-4-sulfonyl ester(NQD-4) and branched novolak resins, which are synthesized in an excess formalin/m-cresol molar ratio (1approximately equals 2) condition. The branched novolak resin-NQD-4 pendent resist (BNP resist) has about two times higher sensitivity than a conventional novolak resist (PR-1024MB) and exhibits clearly a surface development induction, which affords higher (gamma) -values. Copolymerization of hydroquinone (HQ) improves the sensitivity, resist profile, and mask linearity of the BNP resist. The BNP-HQ resist has a resolution capability of 0.35 micrometers lines and spaces with a KrF excimer laser sensitivity of about 170 mJ/cm2. Therefore, our design concept of novolak resin is applicable to high resolution positive resists and especially to excimer resists.

Citation Download Citation

Tsutomu Noguchi and Hidemi Tomita "Novolak resin design concept for high-resolution positive resists", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46366

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