Application of optical emission diagnostics and control related to semiconductor processing

Gregory Viloria; Richard N. Savage

doi:10.1117/12.56652

1 January 1992 Application of optical emission diagnostics and control related to semiconductor processing

Gregory Viloria, Richard N. Savage

Proceedings Volume 1594, Process Module Metrology, Control and Clustering; (1992) https://doi.org/10.1117/12.56652
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States

Abstract

This paper will discuss and show applications of optical emission spectroscopy techniques and methods to monitor plasma emissions during semiconductor processing. A brief discussion of the instrumentation that was used and the software to control the instrumentation will also be presented. Optical emission spectroscopy techniques that will be discussed include chemical species identification in plasma etching, process fingerprinting, contamination detection, endpoint analysis/control and sputter/deposition plasma monitoring.

Citation Download Citation

Gregory Viloria and Richard N. Savage "Application of optical emission diagnostics and control related to semiconductor processing", Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); https://doi.org/10.1117/12.56652

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