Paper
29 July 1992 Observation and control of thin-film defects using in-situ total-internal-reflection microscopy
Forrest L. Williams, Gary A. Peterson Jr., Reed A. Schmell, Charles K. Carniglia
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Abstract
Total internal reflection microscopy (TIRM) is an inspection method that yields an image of the defects in a surface and/or a dielectric thin film. By installing a TIRM system in a vacuum-deposition chamber, the formation of thin-film defects (visible as point-scatter sites) is directly observable. By using such a system, we have examined the effects of deposition conditions on thin-film defect generation. In this preliminary investigation, the rate of defect accumulation in ZrO2 thin films produced by electron-beam (e-beam) evaporation displays a dependence on substrate cleanliness, with cleaner surfaces yielding lesser defect-formation rates. In addition, the presence of film crystallites can be observed by in-situ TIRM, and shows a dependence on the oxygen partial pressure during deposition.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Forrest L. Williams, Gary A. Peterson Jr., Reed A. Schmell, and Charles K. Carniglia "Observation and control of thin-film defects using in-situ total-internal-reflection microscopy", Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); https://doi.org/10.1117/12.60111
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Cited by 6 scholarly publications.
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KEYWORDS
Thin films

Coating

Crystals

Laser induced damage

Thin film deposition

Prisms

Inspection

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